Jerome DUBOIS
Item
- Title
- Jerome DUBOIS
- Given name
- Jerome
- familyName
- DUBOIS
- birthday
- 1971
- Status
- MCF
- Identifier
- scanr:idref130267414
- Is Part Of
- SCENES DU MONDE
- personal mailbox
- jerome.dubois@univ-paris8.fr
- Début de recherche
- 01/09/2008
- Nomenclature CNU
- CNU 18
- firstName
- Jérôme
- Is Referenced By
- idref:130267414
- Subject
-
plasmas
- Rank
- 7
-
plasmas
- Rank
- 6
-
etching
- Rank
- 6
-
plasma etching
- Rank
- 3
-
high-aspect
- Rank
- 3
-
ion
- Rank
- 2
-
molecular dynamics
- Rank
- 2
-
Trees
- Rank
- 2
-
VTK
- Rank
- 2
-
HPC
- Rank
- 2
-
Spot 2
- Rank
- 2
-
Hydrogen
- Rank
- 2
-
SIMD
- Rank
- 2
-
Traitement d'images -- Techniques numériques
- Rank
- 2
-
Vision artificielle (robotique)
- Rank
- 2
-
Systèmes embarqués (informatique)
- Rank
- 2
-
MOS complémentaires
- Rank
- 2
-
CMOS
- Rank
- 2
-
graphene
- Rank
- 2
-
sputter
- Rank
- 2
- list of contributors
- Emilie Despiau-Pujo
- Paulin Brichon
- Vahagn Martirosyan
- Gilles Cunge
- Maxime Darnon
- Philippe Bézard
- Odile Mourey
- Camille Petit-Etienne
- Laurent Vallier
- Nader Sadeghi
- Benjamin Fontaine
- Christelle Boixaderas
- Pascal Gouraud
- Arnaud Rival
- Nicolas Possémé
- Philippe Pébay
- Olivier Joubert
- Olivier Luere
- سلوى البنا
- Yann Canvel
- Sébastien Lagrasta
- Eugénie Martinez
- Alexandre Duret-Lutz
- Etienne Renault
- Maximilien Colange
- Florian Renkin
- Philipp Schlehuber-Caissier
- Dominique Ginhac
- Barthélémy Heyrman
- Michel Paindavoine
- Hasan-Al Mehedi
- Djawhar Ferrah
- Hanako Okuno
- Vincent Bouchiat
- Olivier Renault
- member
-
Direction des Applications Militaires
- Start
- 2019-01-01T00:00:00
- End
- 2022-12-31T00:00:00
-
Biomolécules : Conception, Isolement, Synthèse
- Start
- 2018-01-01T00:00:00
- End
- 2018-12-31T00:00:00
-
University of Paris-Sud Université Paris-Sud
- Start
- 2018-01-01T00:00:00
- End
- 2018-12-31T00:00:00
-
Laboratoire des technologies de la microélectronique
- Start
- 2014-01-01T00:00:00
- End
- 2018-12-31T00:00:00
-
Université Grenoble Alpes
- Start
- 2014-01-01T00:00:00
- End
- 2018-12-31T00:00:00
-
Joseph Fourier University
- Start
- 2014-01-01T00:00:00
- End
- 2015-12-31T00:00:00
-
CEA Saclay
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
Département de Modélisation des Systèmes et Structures
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
Université Paris-Saclay University of Paris-Saclay
- Start
- 2011-01-01T00:00:00
- End
- 2018-12-31T00:00:00
-
Direction des énergies
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
Laboratoire d'informatique fondamentale de Lille
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
UNIVERSITE DE LILLE 1
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
Université de Lille
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
French Institute for Research in Computer Science and Automation Institut national de recherche en informatique et en automatique
- Start
- 2011-01-01T00:00:00
- End
- 2011-12-31T00:00:00
-
Commissariat à l'énergie atomique et aux énergies alternatives Atomic Energy and Alternative Energies Commission
- Start
- 2009-01-01T00:00:00
- End
- 2022-12-31T00:00:00
-
Laboratoire d'Intégration des Systèmes et des Technologies
- Start
- 2009-01-01T00:00:00
- End
- 2009-12-31T00:00:00
-
Direction de la recherche technologique
- Start
- 2009-01-01T00:00:00
- End
- 2009-12-31T00:00:00
-
Centre national de la recherche scientifique French National Centre for Scientific Research
- Start
- 2008-01-01T00:00:00
- End
- 2018-12-31T00:00:00
-
Université de Bourgogne University of Burgundy
- Start
- 2008-01-01T00:00:00
- End
- 2008-12-31T00:00:00
-
Laboratoire d'électronique, d'informatique et d'image
- Start
- 2008-01-01T00:00:00
- End
- 2008-12-31T00:00:00
-
Arts et Métiers Sciences et Technologies Arts et Métiers Institute of Technology
- Start
- 2008-01-01T00:00:00
- End
- 2008-12-31T00:00:00
-
Communauté d'universités et établissements Université Bourgogne - Franche-Comté
- Start
- 2008-01-01T00:00:00
- End
- 2008-12-31T00:00:00
-
heSam Université
- Start
- 2008-01-01T00:00:00
- End
- 2008-12-31T00:00:00
-
Institut national supérieur des sciences agronomiques, de l’alimentation et de l’environnement Agrosup Dijon
- Start
- 2008-01-01T00:00:00
- End
- 2008-12-31T00:00:00
- publications
-
Atomic-scale simulations of low-damage plasma etching processes
- Is Referenced By
- halhal-01891290
- status
- author
-
Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas
- Is Referenced By
- doi10.1063/1.4942892
- status
- author
-
Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching
- Is Referenced By
- doi10.1116/6.0002751
- status
- author
-
Contribution à l'algorithmique et à la programmation efficace des nouvelles architectures parallèles comportant des accélérateurs de calcul dans le domaine de la neutronique et de la radioprotection
- Is Referenced By
- haltel-00676001
- status
- author
-
Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments
- Is Referenced By
- halhal-01942798
- status
- author
-
Plasma solutions for atomic-precision etching: From atomistic simulations to experiments
- Is Referenced By
- halhal-01954916
- status
- author
-
Efficient visualization and analysis of large-scale, tree-based, adaptive mesh refinement simulations with rectilinear geometry
- Is Referenced By
- halcea-03501320
- status
- author
-
Potential Solutions for Atomic Precision Etching
- Is Referenced By
- halhal-01877989
- status
- author
-
In situ Post Etch Treatment on Ge-rich GST after etching in HBr-based plasma
- Is Referenced By
- doi10.1109/iitc/mam57687.2023.10154885
- status
- author
-
Measuring IVDF through high−aspect holes in ICP plasmas
- Is Referenced By
- halhal-01878112
- status
- author
-
Measuring IVDF through high-aspect holes in pulsed ICP plasma
- Is Referenced By
- halhal-01878046
- status
- author
-
Measuring IVDF through high−aspect holes in pulsed ICP plasmas
- Is Referenced By
- halhal-01878113
- status
- author
-
RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas
- Is Referenced By
- halhal-01878109
- status
- author
-
Potential Solutions for Atomic Precision Etching
- Is Referenced By
- halhal-01878051
- status
- author
-
From Spot 2.0 to Spot 2.10: What’s New?
- Is Referenced By
- doi10.1007/978-3-031-13188-2_9
- status
- author
-
Diagnostics of Pulsed Hydrogen Plasmas
- Is Referenced By
- halhal-02339984
- status
- author
-
Diagnostics in Pulsed Hydrogen Plasmas
- Is Referenced By
- halhal-02339983
- status
- author
-
A high speed programmable focal-plane SIMD vision chip
- Is Referenced By
- doi10.1007/s10470-009-9325-7
- status
- author
-
Velocity distribution function of ions through high-aspect ratio holes in Inductively-Coupled Plasma reactor
- Is Referenced By
- halhal-02339972
- status
- author
-
Conception en technologie CMOS d'un système de vision dédié à l'imagerie rapide et aux traitements d'images
- Is Referenced By
- nnt2008dijos021
- status
- author
-
High density H2 and He plasmas: Can they be used to treat graphene?
- Is Referenced By
- doi10.1063/1.5043605
- status
- author
-
Helium plasma modification of Si and Si3N4 thin films for advanced etch processes
- Is Referenced By
- doi10.1116/1.5025152
- status
- author
-
Interactive Visualization and Analysis of High Resolution HPC Simulation Data on a Laptop With VTK
- Is Referenced By
- doi10.1109/scivis.2018.8823596
- status
- author
- Item sets
- Enseignants Chercheurs de Paris 8
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